The micropatterning system is mounted on a Nikon Eclipse Ti2 fluorescence microscope.
Instrument configuration
- Primary objective: Nikon 20x/04.5 objective
- DMD-Size: 1824 pixel x 1140 pixel
- Illuminated field: approx. 500 um x 300 um (20x objective)
- Resolution for patterning: approx. 1.2 um (20x objective) on glass substrate
- Speed: approx. 0.5 s per field of view
- Illumination Laser: 375 nm (200 mW)
- Software: Leonardo control software
