The micropatterning system is a Nikon Eclipse Ti2 fluorescence widefield microscope equipped with an Alveolé Primo-1 digital micromirror device (DMD) that allows UV illumination of the field of view with a pattern. By patterned illumination of the sample, the system enables creating of patterns of surface coating on glass substrates and TEM grids for electron microscopy (e.g. local PEG passivation). In addition, the system is capable of generating 3D hydrogel structures on surfaces.
Instrument configuration
- Primary objective: Nikon 20×/0.45 objective
- Illumination laser: 375 nm (5 mW)
- DMD-size: 1824 pixel × 1140 pixel
- Illuminated field: approx. 500 um × 300 um (20× objective)
- Pixel size: approx. 0.29 um (20x objective)
- Effective resolution of patterning: 1 – 2 um
- Possible heights of hydrogel structures: 40 – 600 um (depending on gel, photoinitiator, and dose of illuminated UV light)
- Speed: approx. 0.5 s per field of view, depending on dose
- Software: Leonardo control software
- Type of sample mounting: compatible with well plates, 35 mm dishes, and chamber slides
