Alvéole Primo Micropatterning System

The micropatterning system is mounted on a Nikon Eclipse Ti2 fluorescence microscope.

Instrument configuration

  • Primary objective: Nikon 20x/04.5 objective
  • DMD-Size: 1824 pixel x 1140 pixel
  • Illuminated field: approx. 500 um x 300 um (20x objective)
  • Resolution for patterning: approx. 1.2 um (20x objective) on glass substrate
  • Speed: approx. 0.5 s per field of view
  • Illumination Laser: 375 nm (200 mW)
  • Software: Leonardo control software